Draft:EBeam Initiative
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| Founded | 2009 |
|---|---|
| Type | Community |
Key people | Aki Fujimura (Co-founder), Jan Willis (Co-founder) |
| Website | www.ebeam.org |
The eBeam Initiative is an alliance of over 50 companies dedicated to advancing electron beam (eBeam) technologies within the semiconductor industry. Established in 2009 by Aki Fujimura and Jan Willis, the Initiative aims to foster collaboration and education to promote new design-to-manufacturing approaches based on eBeam technologies.[1] D2S, Inc. serves as the managing company sponsor of the eBeam Initiative.
Industry Impact
[edit]The eBeam Initiative has been recognized as a source for trends, challenges and solutions for curvilinear photomasks, a new approach to advanced photomasks enabled by multi-beam mask writers and GPU-accelerated inverse lithography technology (ILT). Mark LaPedus, previously of Semiconductor Engineering, detailed the progress and challenges in deploying ILT.[2]
Industry optimism for multi-beam mask writers and EUV technology adoption was also reported by Rick Merritt in EE Times.[3] Leo Pang of D2S emphasized curvilinear masks' benefits in enhancing wafer processing.[4]
Annual surveys are conducted by the Initiative among industry experts ("luminaries") to assess industry opinions on photomask, optical lithography, and EUV lithography trends and debates.[5] Gregory Hayley of Semiconductor Engineering, captured the challenges of pellicles for EUV photomasks and reports curvilinear shift is underway.[6]
Membership
[edit]The eBeam Initiative includes over 50 member organizations across the semiconductor ecosystem, including EDA firms, equipment manufacturers, foundries, and R&D labs.
References
[edit]- ^ Davis, Shannon (February 28, 2024). "eBeam Initiative Marks 15-Year History". Semiconductor Digest. Retrieved April 22, 2025.
- ^ LaPedus, Mark (April 15, 2021). "The Quest For Curvilinear Photomasks". Semiconductor Engineering. Retrieved May 27, 2025.
- ^ Merritt, Rick (September 11, 2017). "Chip Execs More Bullish on EUV". EE Times. Retrieved May 27, 2025.
- ^ Pang, Leo (August 2024). "Why the Mask World is Moving to Curvilinear". Silicon Semiconductor. Retrieved May 27, 2025.
- ^ Fujimura, Aki (August 26, 2024). "12th eBeam initiative survey reports semiconductor industry luminaries are confident in high-NA EUV and curvilinear photomasks". SPIE Digital Library. Retrieved April 22, 2025.
- ^ Haley, Gregory (2025-05-22). "Mask Complexity, Cost, And Change". Semiconductor Engineering. Retrieved 2025-05-27.